Trisilylamine/TSA

Product Code GC-006
CAS Number 13862-16-3
Assay (purity) 99.998%
Purity Method by GC
Molecular Weight 107.33 g/mol
Form Liquid
Appearance colorless
Sensitivity
Melting Point N/A
Molecular Formula (SiH3)3N
Linear Formula

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Safety Information

Signal Word Danger
Pictograms

Hazard Statements H225,H260, H314, H330,H335
Precautionary Statements P280 ,P310,P210, P223,P231+P232,P240,P241,P242,P243,P260, P264, P271, P301+P330+P331, P303+P361+P353,P304+P340, P305+P351+P338,P312, P320,P321, P335+P334,P363,P370+P378, P402+P404, P403+P233,P403+P235, P405,P501P284
UN 3491
Transport Description Toxic by inhalation liquid, water-reactive, flammable, n.o.s. (TRISILYLAMINE)
Hazardous Class 3(4.3, 6.1)
Packing Group Great Danger
In TSCA Registry Yes

Certificates of Analysis (CoA)

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External Identifiers

Pubchem CID
SMILES N/A
IUPAC Name N,N-Disilylsilanamine
InchI Identifier N/A
InchI Key N/A

Other Customers Often Ask:

Application of Trisilylamine

Trisilylamine (TSA) has industrial applications including use as a precursor for the deposition of silicon-containing films in photovoltaic and electronic applications.

Trisilylamine (TSA), (SiH3)3N, is a highly volatile (315 torr at 25°C), carbon- and chlorine-free precursor tailored for Si3N4 and oxynitride deposition at low temperatures (575-700°C). This compound ensures an exceptionally clean process, free of NH4Cl byproducts, while delivering superior step coverage and a customizable Si/N ratio. The resulting silicon nitride films feature minimal hydrogen content

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