Trisilylamine/TSA
- Synonym: SILANAMINE, N,N-DISILYL-; SILANE, NITRILOTRIS-; DISILAZANE, 2-SILYL
- CAS Number: 13862-16-3
Product Code | GC-006 |
CAS Number | 13862-16-3 |
Assay (purity) | 99.998% |
Purity Method | by GC |
Molecular Weight | 107.33 g/mol |
Form | Liquid |
Appearance | colorless |
Sensitivity | |
Melting Point | N/A |
Molecular Formula | (SiH3)3N |
Linear Formula |
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Safety Information
Signal Word | Danger |
Pictograms |
|
Hazard Statements | H225,H260, H314, H330,H335 |
Precautionary Statements | P280 ,P310,P210, P223,P231+P232,P240,P241,P242,P243,P260, P264, P271, P301+P330+P331, P303+P361+P353,P304+P340, P305+P351+P338,P312, P320,P321, P335+P334,P363,P370+P378, P402+P404, P403+P233,P403+P235, P405,P501P284 |
UN | 3491 |
Transport Description | Toxic by inhalation liquid, water-reactive, flammable, n.o.s. (TRISILYLAMINE) |
Hazardous Class | 3(4.3, 6.1) |
Packing Group | Great Danger |
In TSCA Registry | Yes |
Certificates of Analysis (CoA)
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External Identifiers
Pubchem CID | |
SMILES | N/A |
IUPAC Name | N,N-Disilylsilanamine |
InchI Identifier | N/A |
InchI Key | N/A |
Other Customers Often Ask:
Application of Trisilylamine
Trisilylamine (TSA) has industrial applications including use as a precursor for the deposition of silicon-containing films in photovoltaic and electronic applications.
Trisilylamine (TSA), (SiH3)3N, is a highly volatile (315 torr at 25°C), carbon- and chlorine-free precursor tailored for Si3N4 and oxynitride deposition at low temperatures (575-700°C). This compound ensures an exceptionally clean process, free of NH4Cl byproducts, while delivering superior step coverage and a customizable Si/N ratio. The resulting silicon nitride films feature minimal hydrogen content
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