Tetrakis(trifluorophosphine) nickel/Ni(PF3)4
- Synonym: Tetrakis(trifluorophosphane)nickel, Phosphorous trifluoride-nickel
- CAS Number: 13859-65-9
Product Code | GC-012 |
CAS Number | 13859-65-9 |
Assay (purity) | 99% |
Purity Method | by GC |
Molecular Weight | 410.62 g/mol |
Form | Liquid |
Appearance | colorless heavy liquid |
Sensitivity | |
Melting Point | 55 °C |
Molecular Formula | F12NiP4 |
Linear Formula |
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Safety Information
Signal Word | Danger |
Pictograms |
|
Hazard Statements | H314, H317, H334 |
Precautionary Statements | P233, P260, P264, P271, P272, P280, P284, P301+P330+P331, P302 + P361 + P354, P304 + P340, P305 + P354 + P338, P316, P333 + P317, P342 + P316, P362 + P364, P363, P403, P405, P501 |
UN | 1760 |
Transport Description | Corrosive Liquid, Toxic, N.O.S. (Tetrakis(trifluorophosphine)nickel) |
Hazardous Class | 8 |
Packing Group | II |
In TSCA Registry | No |
Certificates of Analysis (CoA)
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External Identifiers
Pubchem CID | |
SMILES | FP(F)F.FP(F)F.FP(F)F.FP(F)F.[Ni] |
IUPAC Name | nickel;trifluorophosphane |
InchI Identifier | InChI=1S/4F3P.Ni/c4*1-4(2)3 |
InchI Key | TXBNRHVYQQTHJK-UHFFFAOYSA-N |
Other Customers Often Ask:
Applications in CVD
In the CVD process, Ni(PF₃)₄ acts as a precursor, being volatilized and decomposed on a substrate to form thin, uniform nickel films. This method is valued for its precision in film thickness, making it essential for applications in semiconductor devices and electronic components.
Research and Niche Uses
Beyond CVD, Ni(PF₃)₄ is used in research to investigate the structural and electronic properties of nickel complexes. It may also find niche applications in catalysis and the synthesis of other compounds, though specific uses are not widely documented.
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