Disilane/DS
- Synonym: DISILICON HEXAHYDRIDE; SILICOETHANE,DISILICON
- CAS Number: 1590-87-0
| Product Code | GC-005 |
| CAS Number | 1590-87-0 |
| Assay (purity) | 99.998% |
| Purity Method | by GC |
| Molecular Weight | 56.17 g/mol |
| Form | gas |
| Appearance | colorless |
| Sensitivity | |
| Melting Point | −132.5°C |
| Molecular Formula | Si2H6 |
| Linear Formula |
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Safety Information
| Signal Word | Danger |
| Pictograms |
|
| Hazard Statements | H250, H220, H280, H319 |
| Precautionary Statements | P280 ,P210, P264, P305+P351+P338,P337+P313,P337,P381,P403,P403+P410 |
| UN | 1954 |
| Transport Description | Compressed gas, flammable, n.o.s.(Disilane) |
| Hazardous Class | 2.1 |
| Packing Group | N/A |
| In TSCA Registry | Yes |
Certificates of Analysis (CoA)
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External Identifiers
| Pubchem CID | |
| SMILES | [Si]#[Si] |
| IUPAC Name | λ3-silanylidynesilicon |
| InchI Identifier | InChI=1S/Si2/c1-2 |
| InchI Key | NTQGILPNLZZOJH-UHFFFAOYSA-N |
Other Customers Often Ask:
Application of Disilane
Disilane and silane thermally decompose around 640 °C, depositing amorphous silicon. This chemical vapor deposition process is relevant to the manufacture of photovoltaic devices. Specifically it is utilized in the production of silicon wafers.
More generally, diorganosilanes are produced by reductive coupling of silyl chlorides, e.g.
- 2 (CH3)3SiCl + 2 Na → (CH3)3Si−Si(CH3)3 + 2 NaCl
Disilane gas can be used to control pressure of Si vapors during process of graphene growth by thermal decomposition of SiC. Pressure of Si vapors influences quality of produced graphene.
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