Phosphorus trifluoride/PF3
- Synonym: Trifluorophosphane, phosphorus trfluoride, Phosphorus fluoride, phosphorus(III) fluoride, Trifluorophosphine, phosphorous trifluoride, Phosphorous fluoride, Trifluorophosphin
- CAS Number: 7783-55-3
| Product Code | GC-007 |
| CAS Number | 7783-55-3 |
| Assay (purity) | 99.8% |
| Purity Method | by GC |
| Molecular Weight | 87.969 g/mol |
| Form | gas |
| Appearance | colorless |
| Sensitivity | moisture |
| Melting Point | −151.5°C |
| Molecular Formula | PF3 |
| Linear Formula |
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Safety Information
| Signal Word | Danger |
| Pictograms |
|
| Hazard Statements | H302,H312,H314,H318,H330, H335 |
| Precautionary Statements | P260,P264,P270,P271,P280,P284,P301+P312,P301+P330+P331, P302+P352,P304+P340,P305+P351+P338,P310,P330,P363,P403+P233,P405,P501 |
| UN | 1955 |
| Transport Description | Compressed gas, toxic, n.o.s. (Phosphorus trifluoride) |
| Hazardous Class | 2.3 |
| Packing Group | N/A |
| In TSCA Registry | Yes |
Certificates of Analysis (CoA)
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External Identifiers
| Pubchem CID | |
| SMILES | FP(F)F |
| IUPAC Name | trifluorophosphane |
| InchI Identifier | InChI=1S/F3P/c1-4(2)3 |
| InchI Key | WKFBZNUBXWCCHG-UHFFFAOYSA-N |
Other Customers Often Ask:
Application of Trifluoride
Phosphorus trifluoride (PF3) is used in semiconductor manufacturing primarily as an etching and cleaning agent. PF3 is applied in plasma etching processes, where it can be used to selectively remove materials from semiconductor wafers. The advantage of PF3 over some other fluorinated gases is its lower global warming potential (GWP), making it a potentially more environmentally friendly option for certain etching applications.
PF3 can also be used in chamber cleaning processes for chemical vapor deposition (CVD) tools.
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